Publikation: Dissertationsschrift

Plasma diagnostics applying K-line emission profiles of Si and Ar

Grunddaten
Abstract
Autoren
Einrichtung

Grunddaten

Titel	Plasma diagnostics applying K-line emission profiles of Si and Ar
Erscheinungsjahr	2014
Publikationsform	Elektronische Ressource
Publikationsart	Dissertationsschrift
Sprache	Englisch
Letzte Änderung	19.02.2015 02:13:50
Bearbeitungsstatus	durch UB Rostock abschließend validiert
Dauerhafte URL	http://purl.uni-rostock.de/fodb/pub/47188
Links zu Katalogen

Abstract

Modifications of K-line profiles due to a warm dense plasma environment are a suitable tool for plasma diagnostics since X-ray emissions strongly depend on the ion configuration an emitter environment. The plasma environment leads to a red shift increasing at higher free electron density and rising temperature. Alternatively, excited states and ionized emitter configurations lead to a blue shift. Both shifts have been taken into account for the calculation of line profiles of silicon and argon.

Autor

Chen, Yi-Ling

Einrichtung

MNF/Institut für Physik (IfPH)